Quartz crucible
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High dislocation free rate
As you know, the yield of silicon growth is influenced from quartz crucible. Because when the crystalpieces are released from quartz crucible's surface and adhere to single ingot, they bring dislocation on ingot.Therefore, quartz crucible is needed undevidrification. The methods are as follows; Less bubbles |
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To purify at quartz crucible's surface is used not only high purity silica sand, but also is contr olled atmosphere and packing materials. AQM-30 is made from synthetic silica materials. Therefore, you can use for long time.
Typical impurities in surface layer (20 micron meter) (ppm)
| Al | Ca | Fe | Na | Ka | Li | Cu |
| 9.2 | 0.6 | 0.4 | 0.3 | 0.3 | 0.3 | <0.05 |
Typical impurities at surface(ng/cm2)
| Al | Ca | Fe | Na | Ka | Li | Cu |
| 0.00096 | 0.00193 | 0.00385 | 0.00000 | 0.00000 | 0.00000 | 0.00000 |
The technology about AQM-40 makes crucibie's surface crystallization in spot. These crystallized spot don't release from surface.( The data of used AQM-40 and AQM-10 are shown in following figures)
The roughness of AQM-40 inner surface after use
The roughness of AQM-10 inner surface after use
Low cost technology
On crucible for not only photo voltage but also semiconductor, lower cost is the most important customer's demands. We are doing R&D any time, and we do the cost reduction without lower the quality.
Techonlogy for recharge
On photo voltage silicon growth, it is trend which is applied multi pulling method to decrease cost. This
method gives big damage on the quartz crucible, AQM-10 doesn't meet with this method. AQM-30 is the
mostexcellent crucible for multi pulling. And AQM-30 doesn't happened liquid vibration, therefore,AQM-30 is extremely good.
